[1] Orji, N. G. et al. Metrology for the next generation of semiconductor devices. Nature Electronics 1, 532-547 (2018). doi: 10.1038/s41928-018-0150-9
[2] Zhu, J. L. et al. Optical wafer defect inspection at the 10 nm technology node and beyond. International Journal of Extreme Manufacturing 4, 032001 (2022). doi: 10.1088/2631-7990/ac64d7
[3] IRDS: International Roadmap for Devices & Systems. (2025). at https://irds.ieee.org/editions/2020
[4] Bonam, R. et al. EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection. Proceedings of SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII. San Jose, CA, USA: SPIE, 2016, 97761C.
[5] Barnes, B. M. et al. Three-dimensional deep sub-wavelength defect detection using λ = 193 nm optical microscopy. Optics Express 21, 26219-26226 (2013). doi: 10.1364/OE.21.026219
[6] Holler, M. et al. Three-dimensional imaging of integrated circuits with macro- to nanoscale zoom. Nature Electronics 2, 464-470 (2019). doi: 10.1038/s41928-019-0309-z
[7] Zhang, D. L. et al. Atomic-resolution transmission electron microscopy of electron beam–sensitive crystalline materials. Science 359, 675-679 (2018). doi: 10.1126/science.aao0865
[8] Nakagaki, R., Honda, T. & Nakamae, K. Automatic recognition of defect areas on a semiconductor wafer using multiple scanning electron microscope images. Measurement Science and Technology 20, 075503 (2009). doi: 10.1088/0957-0233/20/7/075503
[9] Zhang, L. N. et al. Enhanced environmental scanning electron microscopy using phase reconstruction and its application in condensation. ACS Nano 13, 1953-1960 (2019). doi: 10.1021/acsnano.8b08389.s001
[10] Zhu, J. L. et al. Quasi‐newtonian environmental scanning electron microscopy (QN‐ESEM) for monitoring material dynamics in high‐pressure gaseous environments. Advanced Science 7, 2001268 (2020). doi: 10.1002/advs.202001268
[11] Zhu, J. L. et al. Sensing sub-10 nm wide perturbations in background nanopatterns using optical pseudoelectrodynamics microscopy (OPEM). Nano Letters 19, 5347-5355 (2019). doi: 10.1021/acs.nanolett.9b01806
[12] Shiotari, A. et al. Scattering near-field optical microscopy at 1-nm resolution using ultralow tip oscillation amplitudes. Science Advances 11, eadu1415 (2025). doi: 10.1126/sciadv.adu1415
[13] Rogers, E. T. F. et al. A super-oscillatory lens optical microscope for subwavelength imaging. Nature Materials 11, 432-435 (2012). doi: 10.1038/nmat3280
[14] Eggeling, C. et al. Direct observation of the nanoscale dynamics of membrane lipids in a living cell. Nature 457, 1159-1162 (2009). doi: 10.1038/nature07596
[15] Wang. Y. G. et al. Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study. Proceedings of SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII. San Jose, CA, USA: SPIE, 2016, 97761D.
[16] Zhang, J. S. et al. Optical far-field detection of sub-λ/14 wide defects by conjugate structured light-field microscopy (c-SIM). ACS Photonics 10, 3484-3493 (2023). doi: 10.1021/acsphotonics.3c00434
[17] Zhang, J. S. et al. Experimental demonstration of conjugate structured illumination microscopy (c-SIM) for sensing deep subwavelength perturbations in background nanopatterns. ACS Photonics 12, 2710-2719 (2025). doi: 10.1021/acsphotonics.5c00227
[18] Hu, J. Q. et al. High-sensitivity, high-throughput inspection of nanoscale defects using a laser confocal positioning-assisted darkfield imaging system. Optics & Laser Technology 191, 113269 (2025). doi: 10.1016/j.optlastec.2025.113269
[19] Neugebauer, M. et al. Polarization-controlled directional scattering for nanoscopic position sensing. Nature Communications 7, 11286 (2016). doi: 10.1038/ncomms11286
[20] Hernández Pinilla, D. et al. Spectrally adjustable narrowband photonic device based on heat-driven amorphous-to-crystal transformation of Si. Advanced Photonics Research 7, 2500054 (2025).
[21] Vuye, G. et al. Temperature dependence of the dielectric function of silicon using in situ spectroscopic ellipsometry. Thin Solid Films 233, 166-170 (1993). doi: 10.1016/0040-6090(93)90082-Z
[22] Nishida, K. et al. All-optical control of semiconductor nanostructure scattering/absorption via the photothermal effect [Invited]. Journal of the Optical Society of America B 41, D61-D74 (2024). doi: 10.1364/JOSAB.531136
[23] Duh, Y. S. et al. Giant photothermal nonlinearity in a single silicon nanostructure. Nature Communications 11, 4101 (2020). doi: 10.1038/s41467-020-17846-6
[24] Zhang, T. et al. Anapole mediated giant photothermal nonlinearity in nanostructured silicon. Nature Communications 11, 3027 (2020). doi: 10.1038/s41467-020-16845-x
[25] Che, Y. et al. Nanophotonic inspection of deep-subwavelength integrated optoelectronic chips. Science Advances 11, eadr8427 (2025). doi: 10.1126/sciadv.adr8427
[26] Tang, Y. L. et al. Mie-enhanced photothermal/thermo-optical nonlinearity and applications on all-optical switch and super-resolution imaging [Invited]. Optical Materials Express 11, 3608-3626 (2021). doi: 10.1364/OME.431533
[27] Che, Y. et al. Ultrasensitive photothermal switching with resonant silicon metasurfaces at visible bands. Nano Letters 24, 576-583 (2024). doi: 10.1021/acs.nanolett.3c03288
[28] Li, C. H. et al. Nonlinear heating and scattering in a single crystalline silicon nanostructure. The Journal of Chemical Physics 155, 204202 (2021). doi: 10.1063/5.0067251
[29] Nevárez Martínez, M. C. et al. Numerical simulation of light to heat conversion by plasmonic nanoheaters. Nano Letters 25, 230-235 (2025). doi: 10.1021/acs.nanolett.4c04872
[30] Sohn, Y. S. et al. Köhler illumination for high-resolution optical metrology. Proceedings of SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX. San Jose, CA, USA: SPIE, 2006, 61523S.
[31] Jellison, G. E. Jr. & Modine, F. A. Optical functions of silicon at elevated temperatures. Journal of Applied Physics 76, 3758-3761 (1994).
[32] Šik, J., Hora, J. & Humlı́ček, J. Optical functions of silicon at high temperatures. Journal of Applied Physics 84, 6291-6298 (1998). doi: 10.1063/1.368951
[33] Bohren, C. F. & Huffman, D. R. Absorption and scattering by an arbitrary particle. in Absorption and Scattering of Light by Small Particles (eds Bohren, C. F. & Huffman, D. R. ). (New York: Cambridge University Press, 1998).
[34] Yang, C. Y. et al. Nonradiating silicon nanoantenna metasurfaces as narrowband absorbers. ACS Photonics 5, 2596-2601 (2018). doi: 10.1021/acsphotonics.7b01186
[35] García de Abajo, F. J. Colloquium: light scattering by particle and hole arrays. Reviews of Modern Physics 79, 1267-1290 (2007).
[36] Fan, X. F., Zheng, W. T. & Singh, D. J. Light scattering and surface plasmons on small spherical particles. Light: Science & Applications 3, e179(2014).
[37] Fu, P. C. et al. Super-resolution imaging of non-fluorescent molecules by photothermal relaxation localization microscopy. Nature Photonics 17, 330-337 (2023). doi: 10.1038/s41566-022-01143-3
[38] Chen, W. Y., Liu, S. Y. & Zhu, J. L. Pixelated non-volatile programmable photonic integrated circuits with 20-level intermediate states. International Journal of Extreme Manufacturing 6, 035501 (2024). doi: 10.1088/2631-7990/ad2c60
[39] Liu, S., Chen, X. G. & Liu, S. Y. Physics-enhanced learning for automated determination of material optical constants. Laser & Photonics Reviews 19, e00809 (2025). doi: 10.1002/lpor.202500809
[40] Moslehi, M. M., Kermani, A. & Saraswat, K. C. Linearly ramped temperature transient rapid thermal oxidation of silicon. Applied Physics Letters 53, 1104-1106 (1988). doi: 10.1063/1.100656
[41] Krylyuk, S. et al. Rapid thermal oxidation of silicon nanowires. Applied Physics Letters 94, 063113 (2009). doi: 10.1063/1.3079395
[42] Jin, Y. H. et al. Zwitterion-doped liquid crystal speckle reducers for immersive displays and vectorial imaging. Light: Science & Applications 12, 242 (2023).
[43] Evered, C. et al. A review of light sources used for laser speckle reduction in display and imaging applications. Optics & Laser Technology 183, 112407 (2025). doi: 10.1016/j.optlastec.2024.112407
[44] Liu, J. M. et al. Quasi-visualizable detection of deep sub-wavelength defects in patterned wafers by breaking the optical form birefringence. International Journal of Extreme Manufacturing 7, 015601 (2025). doi: 10.1088/2631-7990/ad870e
[45] Zhu, J. L., Udupa, A. & Goddard, L. L. Visualizable detection of nanoscale objects using anti-symmetric excitation and non-resonance amplification. Nature Communications 11, 2754 (2020). doi: 10.1038/s41467-020-16610-0
[46] Ito, T. & Okazaki, S. Pushing the limits of lithography. Nature 406, 1027-1031 (2000). doi: 10.1038/35023233
[47] Shkalim, A. et al. 193nm mask inspection challenges and approaches for 7nm/5nm technology and beyond. Proceedings of SPIE 11148, Photomask Technology. Monterey, CA, USA: SPIE, 2019, 111481G.
[48] McCaulley, J. A. et al. Temperature dependence of the near-infrared refractive index of silicon, gallium arsenide, and indium phosphide. Physical Review B 49, 7408-7417 (1994). doi: 10.1103/PhysRevB.49.7408
[49] Winsemius, P. et al. Temperature dependence of the optical properties of Au, Ag and Cu. Journal of Physics F: Metal Physics 6, 1583-1606 (1976). doi: 10.1088/0305-4608/6/8/017
[50] Arya, M. et al. Which factor determines the optical losses in refractory tungsten thin films at high temperatures. Applied Surface Science 588, 152927 (2022). doi: 10.1016/j.apsusc.2022.152927
[51] Wuttig, M., Bhaskaran, H. & Taubner, T. Phase-change materials for non-volatile photonic applications. Nature Photonics 11, 465-476 (2017). doi: 10.1038/nphoton.2017.126
[52] Robert, H. M. L. et al. Fast photothermal spatial light modulation for quantitative phase imaging at the nanoscale. Nature Communications 12, 2921 (2021). doi: 10.1038/s41467-021-23252-3