[1] Wagner, C. & Harned, N. Lithography gets extreme. Nature Photonics 4, 24-26 (2010). doi: 10.1038/nphoton.2009.251
[2] Sharma, E. et al. Evolution in lithography techniques: microlithography to nanolithography. Nanomaterials 12, 2754 (2022). doi: 10.3390/nano12162754
[3] Ito, T. & Okazaki, S. Pushing the limits of lithography. Nature 406, 1027-1031 (2000). doi: 10.1038/35023233
[4] Erdmann, A. Optical and EUV Lithography: A Modeling Perspective (Bellingham: SPIE, 2021).
[5] Zhang, J. C. et al. Non-local bound states in the continuum for nanoscale alignment. Nature Photonics 20, 296-300 (2026). doi: 10.1038/s41566-026-01847-w
[6] Tseng, M. L. et al. Vacuum ultraviolet nonlinear metalens. Science Advances 8, eabn5644 (2022). doi: 10.1126/sciadv.abn5644
[7] Semmlinger, M. et al. Generating third harmonic vacuum ultraviolet light with a TiO2 metasurface. Nano Letters 19, 8972-8978 (2019). doi: 10.1021/acs.nanolett.9b03961
[8] Semmlinger, M. et al. Vacuum ultraviolet light-generating metasurface. Nano Letters 18, 5738-5743 (2018). doi: 10.1021/acs.nanolett.8b02346
[9] Shen, K. C. et al. Deep‐ultraviolet hyperbolic metacavity laser. Advanced Materials 30, 1706918 (2018). doi: 10.1002/adma.201706918
[10] Kang, M. S. et al. Submicrometer-scale pattern generation via maskless digital photolithography. Optica 7, 1788-1795 (2020). doi: 10.1364/OPTICA.406304
[11] Liu, Y. H. et al. λ/12 super resolution achieved in maskless optical projection nanolithography for efficient cross-scale patterning. Nano Letters 21, 3915-3921 (2021).
[12] Liang, Z. X. et al. Two-photon absorption under few-photon irradiation for optical nanoprinting. Nature Communications 16, 2086 (2025). doi: 10.1038/s41467-025-57390-9
[13] Zheng, L. et al. UV-LED projection photolithography for high-resolution functional photonic components. Microsystems & Nanoengineering 7, 64 (2021). doi: 10.1038/s41378-021-00286-7
[14] Watanabe, Y. et al. Development of deep ultraviolet optical maskless exposure tool for advanced lithography. Journal of Micro/Nanopatterning, Materials, and Metrology 22, 041403 (2023). doi: 10.1117/1.jmm.22.4.041403
[15] Owa, S. Review of optical direct-write technology for semiconductor manufacturing. Journal of Micro/Nanopatterning, Materials, and Metrology 22, 041402 (2023). doi: 10.1117/1.jmm.22.4.041402
[16] Galiullin, A. A. et al. Cost-effective laboratory matrix projection micro-lithography system. Micromachines 15, 39 (2024).
[17] Deng, M. J. et al. Maximizing energy utilization in DMD-based projection lithography. Optics Express 30, 4692-4705 (2022). doi: 10.1364/OE.448231
[18] Chen, J. T. et al. Digital inverse patterning solutions for fabrication of high-fidelity microstructures in spatial light modulator (SLM)-based projection lithography. Optics Express 32, 6800-6813 (2024). doi: 10.1364/OE.502063
[19] Chen, J. T. et al. Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography. Optics & Laser Technology 180, 111578 (2025). doi: 10.1016/j.optlastec.2024.111578
[20] Chan, K. F. et al. High-resolution maskless lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS 2, 331-339 (2003). doi: 10.1117/1.1611182
[21] Yao, N. et al. Improving resolution of superlens lithography by phase-shifting mask. Optics Express 19, 15982-15989 (2011). doi: 10.1364/OE.19.015982
[22] Stuerzebecher, L. et al. High-resolution proximity lithography for nano-optical components. Microelectronic Engineering 132, 120-134 (2015). doi: 10.1016/j.mee.2014.10.010
[23] Gan, Z. F. et al. Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure. Light: Science & Applications 11, 89 (2022).
[24] Pan, Y. H. & Ma, X. Informatics-based computational lithography for phase-shifting mask optimization. Optics Express 30, 21282-21294 (2022). doi: 10.1364/OE.459095
[25] Lee, C. et al. Concurrent optimization of diffraction fields from binary phase mask for three-dimensional nanopatterning. ACS Photonics 10, 919-927 (2023).
[26] Martinsson, H. et al. Current status of optical maskless lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS 4, 011003 (2005). doi: 10.1117/1.1862649
[27] Huang, H. Z. et al. Adaptive pixel-by-pixel modulated 3-D morphometry based on digital micromirror device. IEEE Transactions on Instrumentation and Measurement 73, 5012010 (2024). doi: 10.1109/tim.2024.3368489
[28] Liu, X. et al. Measurement of optical coherence structures of random optical fields using generalized Arago spot experiment. Opto-Electronic Science 2, 220024 (2023). doi: 10.29026/oes.2023.220024
[29] Mendoza-Yero, O. et al. Encoding complex fields by using a phase-only optical element. Optics Letters 39, 1740-1743 (2014). doi: 10.1364/OL.39.001740
[30] Goorden, S. A. et al. Superpixel-based spatial amplitude and phase modulation using a digital micromirror device. Optics Express 22, 17999-18009 (2014). doi: 10.1364/OE.22.017999
[31] Zhu, L. & Wang, J. Arbitrary manipulation of spatial amplitude and phase using phase-only spatial light modulators. Scientific Reports 4, 7441 (2014). doi: 10.1038/srep07441
[32] Sparrow, C. M. On spectroscopic resolving power. Astrophysical Journal 44, 76 (1916). doi: 10.1086/142271
[33] Masters, B. R. Abbe’s theory of image formation in the microscope. in Superresolution Optical Microscopy: the Quest for Enhanced Resolution and Contrast. (ed Masters, B. R. ) (Cham: Springer, 2020), 65-108.
[34] Li, Y. L. et al. A further analysis of the forbidden pitch in photolithography in advanced technology nodes. Proceedings of the 2023 IEEE 15th International Conference on ASIC. Nanjing: IEEE 2023: 1-4.
[35] Apostol, Ş. & Hurley, P. Forbidden pitches: causes, source optimization, and their role in design rules. Proceedings of SPIE 9426, Optical Microlithography XXVIII. San Jose: SPIE, 2015, 404-413.
[36] Liang, Z. X. et al. Diffraction-limit-breaking digital projection lithography via multi-exposure strategies for high-density nanopatterning. Microsystems & Nanoengineering 12, 18 (2026). doi: 10.1038/s41378-025-01131-x
[37] Ronse, K. et al. Fundamental principles of phase shifting masks by Fourier optics: theory and experimental verification. Journal of Vacuum Science & Technology B 12, 589-600 (1994). doi: 10.1116/1.587395
[38] Li, J. Q. et al. Nanoscale multi-beam lithography of photonic crystals with ultrafast laser. Light: Science & Applications 12, 164 (2023).
[39] Hong, L. H. et al. Synergistic nonreciprocity of linear and nonlinear optical diffraction. Physical Review Letters 133, 223801 (2024). doi: 10.1103/PhysRevLett.133.223801
[40] Liu, J. H. et al. Fast wafer focus measurement system for photolithography using on-axis structure illumination method. Optics and Lasers in Engineering 162, 107412 (2023). doi: 10.1016/j.optlaseng.2022.107412
[41] Ding, H. W. et al. Off-axis illumination to solve the forbidden pitch problem in plasmonic lithography. Optics & Laser Technology 183, 112253 (2025). doi: 10.1016/j.optlastec.2024.112253
[42] Ma, X. et al. Optimization of lithography source illumination arrays using diffraction subspaces. Optics Express 26, 3738-3755 (2018). doi: 10.1364/OE.26.003738
[43] Lin B J. Optical Lithography: Here is Why. 2nd edn. (Bellingham: SPIE, 2021).
[44] Giannopoulos, I. et al. Extreme ultraviolet lithography reaches 5 nm resolution. Nanoscale 16, 15533-15543 (2024). doi: 10.1039/D4NR01332H
[45] Han, D. D. et al. Quantitative analysis and modeling of line edge roughness in near-field lithography: toward high pattern quality in nanofabrication. Nanophotonics 8, 879-888 (2019).
[46] Zhao, Y. H. et al. LIC-CGAN: fast lithography latent images calculation method for large-area masks using deep learning. Optics Express 32, 40931-40944 (2024). doi: 10.1364/OE.537921
[47] Li, Z. Q. et al. Decomposition-learning-based thick-mask model for partially coherent lithography system. Optics Express 31, 20321-20337 (2023). doi: 10.1364/OE.488511
[48] Lanza, M. et al. The growing memristor industry. Nature 640, 613-622 (2025). doi: 10.1038/s41586-025-08733-5
[49] Moon, J. H. et al. Materials quest for advanced interconnect metallization in integrated circuits. Advanced Science 10, 2207321 (2023). doi: 10.1002/advs.202207321
[50] Raza, A. et al. Advances, application and challenges of lithography techniques. Proceedings of the 2024 5th International Conference on Advancements in Computational Sciences. Lahore: IEEE, 2024, 1-6.